High-Precision, Ultra-Thin Film Deposition Solution For Vacuum-Sealed Environments

High-Precision, Ultra-Thin Film Deposition Solution for Vacuum-Sealed Environments

 

In high-end manufacturing fields such as semiconductor thin film deposition, precision optical coating, and new energy functional coatings, traditional spraying processes operating under atmospheric conditions cannot meet the demands for high-precision, high-cleanliness thin film preparation. The 60kHz vacuum flange ultrasonic atomization spraying technology, relying on the principle of high-frequency ultrasonic atomization and coupled with a custom-designed injection pump supply system, achieves stable and precise spraying in a fully vacuum-sealed environment, completely avoiding atmospheric interference. This has become a core process solution for vacuum thin film preparation and micro/nano coating processing, suitable for various integrated production and experimental R&D scenarios within vacuum chambers.

 

I. Core Technology Principle: Vacuum-Adaptive High-Frequency Ultrasonic Atomization Mechanism

60kHz is the preferred high-frequency band for industrial precision atomization spraying. Compared to low-frequency ultrasonic spraying at 20kHz and 40kHz, this band offers higher vibration frequencies and stronger atomization precision. Through high-frequency mechanical vibration, liquid coatings, precursor solutions, functional slurries, and other media can be torn into uniformly sized micron-sized ultrafine droplets. The concentrated droplet size and low dispersion lay the foundation for uniform film formation. Unlike conventional open-type ultrasonic spraying equipment, this technology employs a vacuum flange-sealed structure design, abandoning the traditional compressed air carrier gas atomization mode. With no carrier gas involved throughout the process, it fundamentally avoids airflow disturbance to the vacuum chamber environment, perfectly adapting to vacuum-sealed conditions.

 

The core nozzle of the equipment seamlessly connects to the vacuum chamber via a standard vacuum flange. The overall sealed architecture is adaptable to vacuum conditions ranging from 13Pa to 133Pa. Even under negative pressure conditions within the chamber, it maintains stable high-frequency vibration without leakage, atomization attenuation, or pressure imbalance. In a vacuum environment, ultrafine droplets are unaffected by air resistance and oxidation, depositing uniformly and steadily onto the substrate surface. Droplet spreadability is significantly improved, forming a dense, uniform, pinhole-free ultra-thin functional coating, solving the industry problems of droplet dispersion, oxidation agglomeration, and uneven film thickness encountered in atmospheric spraying.

 

II. Core Advantages of the System: Precision Spraying Capabilities Adapted to Vacuum Conditions

1. Full Vacuum Adaptability, Extremely High Process Cleanliness
The entire system adopts a flange-sealed integrated design with no external air intake structure, making it fully adaptable to the sealed working environment of a vacuum chamber. It can complete the entire spraying process under high vacuum conditions. In a vacuum environment, there is no interference from oxygen, dust, or water vapor, resulting in coatings free of oxidation impurities and particle residues, greatly improving the purity and stability of functional films. This perfectly suits production scenarios with high cleanliness requirements, such as semiconductors, precision optics, and biomedicine. Simultaneously, the equipment is compatible with various standard vacuum chambers, supports modular integration, is easy to install, and has strong compatibility, allowing direct connection to downstream processes such as vacuum deposition and vacuum annealing.

 

2. Excellent Atomization Precision, Outstanding Coating Uniformity
The 60kHz high-frequency ultrasonic atomization possesses extremely strong atomization stability, generating ultrafine droplets with uniform particle size and high consistency. Combined with a customized injection pump for constant-flow precision liquid supply, it completely avoids atomization anomalies caused by liquid supply fluctuations. The final coating achieves a uniformity exceeding 95%, with film thickness precisely controlled at the nanometer to micrometer level. The coating is dense, smooth, and free of orange peel and pinholes. Compared to traditional spraying and spin coating processes, film quality and consistency are significantly improved, making it particularly suitable for ultra-thin functional coatings and precise micro-area spraying applications.

 

3. Wide Media Adaptability and Strong Process Controllability: Leveraging the 60kHz high-frequency atomization characteristics and a custom-designed adjustable flow system with a syringe pump, the equipment is adaptable to various liquid media, including aqueous solutions, alkoxide solutions, conductive inks, photoresists, nano-slurries, and polymer solutions. Stable atomization spraying can be achieved with both low-viscosity trace reagents and medium-viscosity functional slurries. The system supports intelligent formula management via a touchscreen, storing multiple sets of spraying process parameters. One-click start of the spraying process allows for precise control of spraying path, liquid supply rate, atomization power, and vacuum parameters. The process exhibits extremely high repeatability, making it suitable for both mass production and laboratory research applications.

 

4. Extremely Low Loss, Energy Efficient
Ultrasonic atomization spraying relies on high-frequency vibration to achieve pressureless atomization. Combined with a precise injection pump for liquid supply, the coating utilization rate is far higher than traditional pneumatic spraying, with virtually no droplet scattering or waste, resulting in extremely low material loss. Simultaneously, the equipment boasts low overall power consumption and stable operation. The vacuum-sealed operation mode eliminates the need for subsequent dust and impurity removal processes, simplifying the production process, significantly improving process efficiency, and reducing production and R&D costs.

 

III. Core Application Scenarios
Leveraging its core advantages of vacuum sealing, high precision, high cleanliness, and strong controllability, the 60kHz vacuum flange ultrasonic atomization spraying + customized injection pump integrated system is widely used in high-end precision manufacturing fields. In the new energy industry, it can be used for fuel cell catalyst layer spraying, thin-film solar cell functional layer deposition, and lithium battery separator functional coating preparation; in the semiconductor and electronics industry, it is suitable for chip micro-area coating, circuit board moisture-proof insulating coating, and optoelectronic component transparent coating processes; in the precision optics field, it can prepare optical anti-reflective films, anti-reflective films, and protective wear-resistant films; in the biomedical field, it is suitable for high-precision scenarios such as microfluidic chip functional coating and biosensor film preparation.

 

IV. Technical Summary The 60kHz vacuum flange ultrasonic atomization spraying technology, combined with the precise liquid supply advantages of a customized vacuum-grade injection pump, breaks through the application bottlenecks of traditional spraying processes in vacuum environments, achieving a precision spraying process characterized by vacuum sealing, high precision, high cleanliness, and low loss. This integrated system eliminates carrier gas dependence, is sealed to adapt to vacuum conditions, and offers precise control over both atomization and liquid supply. It perfectly meets the process requirements of high-end thin film preparation and micro/nano precision coatings, filling the technological gap in fine atomization spraying under vacuum conditions. It is an indispensable core process equipment solution in the fields of high-end precision manufacturing and new material research and development, and its application boundaries will continue to expand in high-end industries such as semiconductors, new energy, and precision optics in the future.